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Another important factor that can be assessed with thermal resistance tests is the performance of the laminate in printed circuit board applications that expose the board to high-operating temperatures Several different test methods should be considered when qualifying laminates 125231 Solder Dip Resistance The test method is described in IPC-TM-650, method 2423The original purpose of this test technique was to assess the solderability of the laminate surface, but today it is often used to assess the ability of laminate materials to withstand the temperatures in a molten solder bath It is important to note that the original IPC methodology has not been revised in a long time and the current version may not reflect the actual temperature requirements of lead-free processing.

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The authors still feel that this method is a very good assessment and differentiation technique for laminate materials and recommend that either solder pot temperatures or exposure times are increased if the laminates are intended for use in lead-free assembly processes Performance factors that are being considered are resistance to softening, loss of surface resin, scorching, delamination, blistering, and measling The material will be tested in three different surface configurations: (1) a surface upon which no metal cladding was ever applied (if possible), (2) a surface with the metal cladding removed by standard etching processes, and (3) a surface with metal cladding as received The sample size for all specimen is 1 1/4 in 1 1/4 in thickness and three samples are required for each surface configuration All samples are tested using the same procedure Preclean the samples by immersing them for 15 sec.

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in 10 percent hydrochloric acid (HCl) (by volume) and then rinse in water The HCl should be at a temperature of 60 C (140 F) Dry the specimen quickly to avoid excess oxidation of the sample Dip the sample into a flux agent and allow draining for 60 sec before proceeding with the solder dip Stir and then skim the surface of the molten solder with a clean stainless steel paddle to ensure that the solder.

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TABLE 26.3 Cleaning Solutions Used to Remove Various Contaminants Cleaning technique Abrasion Plasma Chemical solutions (aqueous etchants) Chemical solutions (nonaqueous) Thermal Process chemistry Pumice, Al oxide CF4/O2, O2/H2O H2SO4, HCl, etc. Alcohols, etc. N2 Contaminant removed All Organic Inorganic Organic H2O

Source: Adapted from Introduction to Microlithography, 1st ed., L. F. Thompson and M. J. Bowden, American Chemical Society Symposium Series 219, Washington, D.C., 1983, p. 184.

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pumice can remain on the copper surface Maintaining proper functioning of the mechanical parts that contact the product is essential since brushes and slurry deteriorate with use Equipment designs that isolate the abrasive from the majority of the tool are more durable 26622 Chemical Cleaning Chemical cleaning includes a variety of solutions since the solubility of contaminants can be quite different (see Table 263) Grease and fingerprints require a soap solution or solvent to dissolve them Antitarnish treatment removal and copper roughening is done with mild etchants for the copper, such as ammonium persulfate, sodium persulfate, or peroxide/sulfuric acid Depending on the oxidation level and the amount of antitarnish treatment, there is often an induction time for copper removal Solutions used can be common chemicals or proprietary mixtures in which surfactants and other additives have been included.

Alternatively, the oxide and antitarnish treatment can be removed initially, followed by a surface roughening In this case, the oxide removal is accomplished with mild acidic cleaning solutions such as sulfuric acid The selection of the cleaning solution also depends on the copper thickness Thin seed layers used for electrolytic pattern plating can tolerate very little etching, and extremely dilute solutions or dry methods are used Thus, chemical adhesion can be more important than mechanical15 Selection of the proper process chemicals and sequence depends on the overall conductor formation process and the photoresist to be used Chemical cleaning sequences are often contained in conveyorized spray equipment with rinsing between each step Batch processing in a tank system is also used, with a hoist for basket movement between solutions.

Monostructure elastic spring guideways, electromagnetic or electrostatic line movement guideways, thermal deformation line movement guideways Electrostatic and electromagnetic deflection, electrostrictive and magnetostrictive line movements

Uniformity of the etching of panels within a basket must be measured, but is generally quite good and reproducible as long as the immersion time is short and the bath s chemical composition is consistent 26623 Electrolytic Cleaning A unique inline conveyorized tool built by Atotech uses electrolytic cleaning16,17 The antitarnish is removed electrolytically along with oils and fingerprints in a uniform process with very little copper removal The surface texture is then altered by microetching and passivated prior to dry-film photoresist lamination or other coatings 2663 Photoresist Application The technique used to apply the photoresist to the substrate depends on the type of photoresist selected The various techniques used with dry-film and liquid photoresists are discussed.

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